Photolithography

1. Photolithography

4. Photo-litho-graphy: latin: light-stone-writing

5. In 1826, Joseph NicephoreNiepce, in Chalon, France, takes the first photograph using bitumen of Judea on a pewter plate, developed using oil of lavender and mineral spirits

6. In 1935 Louis Minsk of Eastman Kodak developed the first negative photoresist

7. In 1940 Otto Suess developed the first positive photoresist.

9. Spincoating

10. Prebaking

11. Exposure

12. Development

14. It contains a light-sensitive substance whose properties allow image transfer onto a printed circuit board.

16. Exposed resist is washed away by developer so that the unexposed substrate remains

17. Results in an exact copy of the original design

18. Exposure to UV light causes the resist to polymerize, and thus be more difficult to dissolve

19. Developer removes the unexposed resist

21. Negative Resist Photolithography Step 3: Prebaking Following spincoating, wafers need to be baked on a hotplate. Step 4: Exposure Wafers are exposed to UV light using the karlsuss or evalign instruments. A mask is used to transfer the design to etch the design onto the spincoated resist. The energy and time required can vary with resist thickness, so refer to the SU-8 data sheets.

22. Negative Resist Photolithography Step 5: Postbaking Following exposure, wafers need to be baked on a hotplate again. Refer to the SU-8 data sheets for baking times. Step 6: Development Wafers are placed in SU-8 developer, which removes resist that was not exposed to UV light. Only the desired features remain. Development times vary with thickness, so refer to the SU-8 data sheets.

23. Positive Resist Photolithography For all subsequent layers after the first layer, do NOT re-prime the wafer. Wafers with photoresist on them cannot be put in priming instruments. Step 1: Spincoating & Prebaking For positive resist (SPR 220), we use the svgcoat instruments. These are automated tracks where pre-set recipes are used for specific thicknesses. Different thicknesses require different prebaking strategies. Ask a section member for advice.

24. Positive Resist Photolithography Step 2: Exposure Once again, the karlsuss or evalign instruments are used for exposure. There are no reliable data sheets for SPR resist. Therefore, ask a section member for advice on what settings to try first. Step 3: Development Use the automated svgdev tracks for positive resist.

25. Positive Resist Photolithography Step 4: Postbaking (optional) If your positive resist is a mold for a channel that will have a valve or pump above it (like in this sample design), you should postbake it. This curves the cross-section, which allows for complete closure of the channel. Postbaking 120 ˚C, 5 min Postbakingshould be done at 120 ˚C for at least 5 min. Check the profile using a microscope. If no valve is employed, there is no need to postbake.